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[n]	D. Luo et al., “Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid”, in Proc. NAPAC'19, Lansing, MI, USA, Sep. 2019, pp. 699-702. doi:10.18429/JACoW-NAPAC2019-WEPLM47

For LaTeX

%\cite{Luo:NAPAC19-WEPLM47} \bibitem{Luo:NAPAC19-WEPLM47} D. Luo \emph{et al.}, \textquotedblleft{Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid}\textquotedblright, in \emph{Proc. NAPAC’19}, Lansing, MI, USA, Sep. 2019, pp. 699--702. \url{doi:10.18429/JACoW-NAPAC2019-WEPLM47}

For BibTeX

@inproceedings{luo:napac19-weplm47, author = {D. Luo and others}, title = {{Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid}}, booktitle = {Proc. NAPAC'19}, pages = {699--702}, paper = {WEPLM47}, venue = {Lansing, MI, USA, Sep. 2019}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-NAPAC2019-WEPLM47}, url = {https://jacow.org/napac2019/papers/WEPLM47.pdf}, language = {english} }

References

• D. Luo et al., “Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid”, in Proc. North American Particle Accelerator Conf. (NAPAC'19), Lansing, MI, USA, Sep. 2019, pp. 699-702.