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[n]	A. Heuberger, “Lithography Production Techniques for next Generations of Microelectronics”, in Proc. EPAC'92, Berlin, Germany, Mar. 1992, pp. 192-197. 
[n]	D. Reggiani, D. C. Kiselev, M. Seidel, V. Talanov, and M. Wohlmuther, “Combined MCNP/Turtle Simulation of the SINQ Beam Line at PSI-HIPA”, in Proc. IPAC'19, Melbourne, Australia, May 2019, pp. 2410-2413. doi:10.18429/JACoW-IPAC2019-WEPMP038

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