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[n]	N. Nakamura et al., “Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography”, in Proc. IPAC'19, Melbourne, Australia, May 2019, pp. 3478-3481. doi:10.18429/JACoW-IPAC2019-THPMP013

For LaTeX

%\cite{Nakamura:IPAC19-THPMP013} \bibitem{Nakamura:IPAC19-THPMP013} N. Nakamura \emph{et al.}, \textquotedblleft{Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography}\textquotedblright, in \emph{Proc. IPAC’19}, Melbourne, Australia, May 2019, pp. 3478--3481. \doi{10.18429/JACoW-IPAC2019-THPMP013}

For BibTeX

@inproceedings{nakamura:ipac19-thpmp013, author = {N. Nakamura and others}, title = {{Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography}}, booktitle = {Proc. IPAC'19}, pages = {3478--3481}, paper = {THPMP013}, venue = {Melbourne, Australia, May 2019}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-IPAC2019-THPMP013}, url = {http://accelconf.web.cern.ch/ipac2019/papers/THPMP013.pdf}, language = {english} }

References

• N. Nakamura et al., “Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography”, in Proc. 10th Int. Particle Accelerator Conf. (IPAC'19), Melbourne, Australia, May 2019, pp. 3478-3481.