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[n]	N. Nakamura et al., “Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography”, in Proc. IPAC'19, Melbourne, Australia, May 2019, pp. 3478-3481. doi:10.18429/JACoW-IPAC2019-THPMP013
[n]	N. G. Johnson and W. E. Norum, “Resonant Ramping Scheme for CLS Booster Dipole Magnets”, in Proc. PAC'99, New York, NY, USA, Mar. 1999, paper FRA162, pp. 3764-3766. 

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