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[n]	V. Rodin et al., “Overview of power deposition profiles in the LHC off-momentum cleaning section in Run 3”, in Proc. IPAC'25, Taipei, Taiwan, Jun. 2025, pp. 302-305. doi:10.18429/JACoW-IPAC2025-MOPM014
[n]	M. J. Prandolini, R. Riedel, M. Schulz, and F. Tavella, “A Review of High Power OPCPA Technology for High Repetition Rate Free-Electron Lasers”, in Proc. FEL'14, Basel, Switzerland, Aug. 2014, paper TUA02, pp. 310-317. 

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