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For Word

[n]	Y. Lee et al., “Multicusp Ion Source for Ion Projection Lithography”, in Proc. PAC'99, New York, NY, USA, Mar. 1999, paper WEP144, pp. 2575-2577. 

For LaTeX

%\cite{Lee:PAC99-WEP144} \bibitem{Lee:PAC99-WEP144} Y. Lee \emph{et al.}, \textquotedblleft{Multicusp Ion Source for Ion Projection Lithography}\textquotedblright, in \emph{Proc. PAC’99}, New York, NY, USA, Mar. 1999, paper WEP144, pp. 2575--2577.

For BibTeX

@inproceedings{lee:pac99-wep144, author = {Y. Lee and others}, title = {{Multicusp Ion Source for Ion Projection Lithography}}, booktitle = {Proc. PAC'99}, pages = {2575--2577}, paper = {WEP144}, venue = {New York, NY, USA, Mar. 1999}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/p99/papers/WEP144.pdf}, language = {english} }

References

• Y. Lee et al., “Multicusp Ion Source for Ion Projection Lithography”, in Proc. 18th Particle Accelerator Conf. (PAC'99), New York, NY, USA, Mar. 1999, paper WEP144, pp. 2575-2577.